Anomalous Hall effect behavior in (100) and (110) CrO2 thin films

نویسندگان

  • H. Sato
  • M. Pathak
  • D. Mazumdar
  • X. Zhang
  • G. J. Mankey
  • P. LeClair
  • A. Gupta
چکیده

Articles you may be interested in Giant planar Hall effect in reactive sputtered epitaxial Cr x Fe3– x O4 films Planar Hall effect and magnetic anisotropy in epitaxially strained chromium dioxide thin films Appl. Magnetoresistance and Hall effect of chromium dioxide epitaxial thin films First and second order magnetic anisotropy constants have been determined in (110) and (100) CrO 2 films using magnetometry and anomalous Hall effect measurements. Higher in-plane anisotropy is observed in strain-free (110) CrO 2 films as compared to strained (100) CrO 2 films, while out-of-plane magnetic anisotropy (OPMA) is stronger in (100) films. Temperature-dependent OPMA is particularly striking for (110) films with a sharp drop below 200 K, whereas for (100) films the anisotropy increases as the temperature decreases. These results are consistent with changes in the magnetization orientation with decreasing temperature, possibly caused by differences in the thermal expansion coefficient between the substrate and film.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Coexistence of universal and topological anomalous hall effects in metal CrO2 thin films in the dirty limit.

The scaling exponent of 1.6 between anomalous Hall and longitudinal conductivity, characteristic of the universal Hall mechanism in dirty-metal ferromagnets, emerges from a series of CrO2 films as we systematically increase structural disorder. Magnetic disorder in CrO2 increases with temperature and this drives a separate topological Hall mechanism. We find that these terms are controlled disc...

متن کامل

Highly spin-polarized chromium dioxide thin films prepared by chemical vapor deposition from chromyl chloride

Highly spin-polarized chromium dioxide (CrO2) thin films were deposited on ~100! TiO2 substrates by chemical vapor deposition using chromyl chloride as a precursor. The spin polarization, as measured by the point contact Andreev reflection technique, was 8163%. X-ray diffraction u/2u scans indicated the films grew completely ~100! oriented, in registry with the ~100! oriented TiO2 substrate. X-...

متن کامل

Evidence for two-band magnetotransport in half-metallic chromium dioxide

Magnetotransport measurements were made on patterned, ~110! oriented CrO2 thin films grown by the high-pressure, thermal decomposition of CrO3 onto rutile substrates. The low-temperature Hall effect exhibits a sign reversal from positive to negative as the magnetic field is increased above 1 T, which may be interpreted within a simple two-band model as indicating the presence of highly mobile (...

متن کامل

Thickness Dependence of Magnetic and Transport Properties of Chromium Dioxide (CrO2) Strained Epitaxial Thin Films

Chromium dioxide (CrO2) thin films of different thicknesses (120–2600 A) have been grown epitaxially on (100)-oriented TiO2 substrates by the chemical vapor deposition technique. The thicker films, with a Curie temperature of 395 K, exhibit in-plane magnetocrystalline anisotropy with the magnetic easy axis along the -axis direction. At low temperatures, the easy axis is deflected from the towar...

متن کامل

Growth and magnetotransport study of thin ferromagnetic CrO2 films

Highly a-axis-textured CrO2 films have been deposited on Al2O3(0001) and on isostructural TiO2(100) substrates by a chemical vapour deposition technique. For Al2O3 substrates a columnar growth of CrO2(010) on an initial Cr2O3(0001) layer has been found in transmission electron microscopy as well as in x-ray diffraction investigations. The sixfold in-plane symmetry of a (0001)-oriented Cr2O3 ini...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2015